Temperature dependence of metal film growth via low‐energy electron diffraction intensity oscillations: Pt/Pd(100)
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Temperature dependence of metal film growth via low‐energy electron diffraction intensity oscillations: Pt/Pd(100)
A commercial, conventional low‐energy electron diffraction apparatus is used to monitor Bragg intensity oscillations during the growth of Pt on Pd(100). The effect of substrate temperature between 80 and 400 K is investigated. Between 80 and 300 K, two to three Bragg oscillations are observed. The oscillation amplitude damps out quickly as film coverage increases at fixed temperature, but damp ...
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ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
سال: 1989
ISSN: 0734-2101,1520-8559
DOI: 10.1116/1.575950